Veeco Instruments Inc., a global leader in Process Equipment technology announced that the company will take part in the fourth International Symposium on Growth of III-Nitrides (ISGN4) on Wednesday, July 16-19, 2012 in St. Petersburg, Russia. On the symposium, Veeco will make a speech and showcase its latest products and technology.
 
Alex Gurary, Ph.D., Veeco’s Senior Director, MOCVD Hardware Test, will present “Reactants injector temperature effect on III-Nitrides materials deposition in the high speed vertical rotating disc MOCVD reactor.” Dr. Gurary has a Ph.D. in Material Science and over 20 years of experience with metal organic chemical vapor deposition (MOCVD) equipment.
 
Veeco’s market-leading MOCVD equipment for high brightness LED production deliver unequaled wavelength uniformity, superior footprint efficiency and a range of single and multi-reactor platforms that offer the best cost of ownership solutions in the industry.
 
The ISGN4 symposium is organized by the Ioffe Physical-Technical Institute of Russian Academy of Sciences. Launched in Sweden in 2006, then Japan in 2008, France in 2010 and now Russia, it is the fourth symposium in a biannual series focusing specifically on growth of III-Nitride materials, nanostructures and device structures.